Iis? available copy

ABSTRACT

-CH2-CH(-OH)-, -CH2-CH(-OOC-CH3)-, -CH2-CH(-OOC-C6H5)-,   -CH2-CH(-OOC-CH(-C2H5)-(CH2)3-CH3)-, -CH2-CH(-OOC-CH=CH- UTRAVIOLET ABSORPTIVE MASKS ARE PREPARED FROM LIGHTSENSITIVE ELEMENTS COMPRISING A SUPPORT WHICH IS TRANSPARENT TO ULTRAVIOLET RADIATION BEARING A LAYER OF A LIGHTSENSITIVE POLYMER WHICH IS HIGHLY ABSORPTIVE OF ULTRAVIOLET RADIATION. THE MASKS ARE PREPARED BY IMAGEWISE EXPOSING THE ELEMENT TO ACTINIC RADIATION TO INSOLUBILIZE POLYMER IN THE EXPOSED AREAS AND DEVELOPING AN ULTRAVIOLET ABSORPTIVE IMAGE BY REMOVING POLYMER FROM THE UNEXPOSED AREAS. THESE MASKS ARE EMPLOYED IN THE PREPARATION OF PHOTORESIST IMAGES IN THE SAME MANNER AS SILVER HALIDE MASKS ARE EMPLOYED IN THIS ART. USEFUL POLYMERS INCLUDE THOSE WHICH HAVE APPENDED TO THE POLYMER BACKBONE A MOIETY DERIVED FROM A P-(2,5DIHYDRO-3-CYANO-2-OXO-4-PHENYL-5-FURYLIDENEMETHYL BENZOIC ACID OR BENZOYL CHLORIDE AND A MOIETY DERIVED FROM EITHER A P-(2-ETHOXYCARBONYLVINYL) CINNAMIC ACID OR CINNAMOYL CHLORIDE OR A P-(2-ETHYLHEXYLOXYCARBONYLVINYL) CINNAMIC ACID OR CINNAMOYL CHLORIDE. PARTICULARLY PREFERRED ARE POLYMERS HAVING THE STRUCTURAL FORMULA   (1,4-PHENYLENE)-CH=CH-COO-C2H5)-, AND (2-(O=),3-NC,4-C6H5-   2,5-DIHYDROFUR-5-YLIDENE)=CH-(1,4-PHENYLENE)-COO-CH(-)-   CH2-   IN THIS STRUCTURE THE PREFERRED MOLE RATIO OF THE VARIOUS REPEATING UNITS IS SHOWN DIRECTLY BELOW THE CORRESPONDING UNITS AND THE PREFERRED RANGE FOR THE REPEATING UNITS IS SHOWN THEREBELOW IN PARENTHESES.

AVASLABLE cow 900, 7

' DEFENSIVE PUBLICATION UNITED STATES PATENT OFFICE Published at the request at the applicant or owner in accordance with the Notice 0! Dec. 10. 1969. 889 0.0.187. The abstracts of Detensive Publication applications are identified by distinctly numbered series and are arranged chronologically. The heading or each abstract indicates the number 0! page: at Ipecldeation, including claim and sheets of drawings contained. in the application as originally died. The me: at these applications are available to the public to: inspection and reproduction may be purchased tor 30 cents a sheet.

Detenslve Publication applications have not been enmin no assertion u to the novelty at the dlseloeed subject matter.

ed a to the merits o1 alleged invention. The Eaten: Once makes .PUBLISHIED JULY 18, 1972 1900.009 ULTRAVIOLET ABSORPTIVE MASKS Kenneth R. Dnnham and Marshall E. Yost, both of Kodak Park Works, Rochester, N.Y. 14650 Filed Aug. 23, 1971, Ser. No. 174,223 Int. Cl. G03e N68 US. Cl. 96115 No Drawing. 1mg: Specification Ultraviolet ahsorptiveirriaslts, re prepared from lightsensitive elements comprising a support which is transparent to ultraviolet radiation bearing a layer of a lightsensitive polymer which is highly absorptive of ultraviolet radiation. The masks are prepared by imagewise exposing the element to actinic radiation to insolubilize polymer in the exposed areas and developing an ultraviolet absorptive image by removing polymer from the unexposed areas. These masks are employed in the preparation of photoresist images in the same manner as silver halide masks are employed in this art.

Useful polymers include those which have appended to the polymer backbone a moiety derived from a p-(2,5- dihydro 3 cyano-Z-oxo-Lphenyl 5 furylidenemethyl) benzoic acid or benzoyl chloride and a moiety derived from either a p-(Z-ethoxycarbonylVinyDcinnamic acid or cinnamoyl chloride or a p-(Z-ethylhexyloxycarbonylvinyl) cinnamic acid or cinnamoyl chloride. Particularly preferred are polymers having the structural formula A f, I l c =o (04 6) (EH. I all?) 0 {car-in}- {cm-c cm-cn nc-cin, hr:

In this structure the preferred mole ratio of the various repeating units is shown directly below the corresponding units and the preferred range for the repeating units is shown therebelow in parentheses. 

